Issue Eur. Phys. J. B Volume 66, Number 4, December II 2008 Page(s) 455 - 459 Section Solid State and Materials DOI 10.1140/epjb/e2008-00452-x Published online 12 December 2008

Eur. Phys. J. B 66, 455-459 (2008)
DOI: 10.1140/epjb/e2008-00452-x

Full X-ray pattern analysis of vacuum deposited pentacene thin films

O. Werzer¹, B. Stadlober², A. Haase², M. Oehzelt³ and R. Resel<sup>1

1</sup>  Institute of Solid State Physics, Graz University of Technology, Petersgasse 16, 8010 Graz, Austria
²  Institute of Nanostructured Materials and Photonics, JOANNEUM RESEARCH Forschungsgesellschaft mbH, Weiz, Austria
³  Institute of Experimental Physics, Johannes Kepler University, Linz, Austria

o.werzer@gmx.at

Received 25 August 2008 / Received in final form 14 October 2008 / Published online 12 December 2008

Abstract
Pentacene thin films with thicknesses ranging from 10 nm to 180 nm are investigated by specular X-ray diffraction in the reflectivity regime and in the wide angular regime. The results of the reflectivity measurements show a clear shift of the 001 reflection of the thin film phase depending on the layer thickness. It is shown that this shift can be explained by the dynamical scattering theory. The wide angular regime measurements show the 00L of the thin film phase. Williams-Hall plots are used to extract information on the crystallite size and mean micro strain of the thin film phase. The crystallite size is in good agreement with the results obtained by the reflectivity measurements. From this it can be concluded that the thin film phase crystallites are extended over the entire film thickness down to the substrate. Additionally an increase of the micro strain with increasing film thickness is observed.

PACS
61.05.C- - X-ray diffraction and scattering.
68.35.bm - Polymers, organics.
61.82.Rx - Nanocrystalline materials.

© EDP Sciences, Società Italiana di Fisica, Springer-Verlag 2008

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